[Federal Register Volume 76, Number 220 (Tuesday, November 15, 2011)]
[Notices]
[Pages 70758-70759]
From the Federal Register Online via the Government Publishing Office [www.gpo.gov]
[FR Doc No: 2011-29079]
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DEPARTMENT OF JUSTICE
Antitrust Division
Notice Pursuant to the National Cooperative Research and
Production Act of 1993--Sematech, Inc. D/B/A International Sematech
Notice is hereby given that, on August 4, 2011, pursuant to Section
6(a) of the National Cooperative Research and Production Act of 1993,
15 U.S.C. 4301
[[Page 70759]]
et seq. (``the Act''), Sematech, Inc. (which is doing business as
International SEMATECH) has filed written notifications simultaneously
with the Attorney General and the Federal Trade Commission disclosing
changes in its membership and its nature and objectives. The
notifications were filed for the purpose of extending the Act's
provisions limiting the recovery of antitrust plaintiffs to actual
damages under specified circumstances. Specifically, Taiwan
Semiconductor Manufacturing Corporation, Inc., Hsinchu, Taiwan; United
Microelectronics Corporation, Inc., Hsin Chu City, Taiwan; Samsung
Electronics Co., Ltd., Yongin-City, Gyeonggi-Do, Republic of Korea;
College of Nanoscale Science and Engineering of the University of
Albany, State University of New York, Albany, NY; Fuller Road
Management Corporation, Inc. of the University of Albany, State
University of New York, Albany, NY; Tokyo Electron Limited, Minato-ku,
Tokyo, JAPAN; Canon Anelva Corporation, Kanagawa, Japan; Asahi Glass
Corporation, Chiyodaku, Tokyo, Japan; FEI Company, Hillsboro, OR; SUSS
MicroTec AG, Thiendorf, Germany; ASML Holding N.V., Veldhoven, The
Netherlands; KLA-Tencor Corporation, Milpitas, CA; Qualcomm
Incorporated, San Diego, CA; Nanosys Inc., Palo Alto, CA; 4DS Inc.,
Fremont, CA; Intel, Inc., Santa Clara, CA; TSMC, Hsinchu, Taiwan; Hynix
Semiconductor Inc., Geonggi-Do, Republic of Korea; Tokyo Electron
Limited, Minato-ku, Tokyo, Japan; Rudolph Technologies Inc., Flanders,
NJ; ON Semiconductor, Phoenix, AZ; NEXX Systems Inc., San Francisco,
CA; Atotech Deutchland GmbH, Berlin, Germany; Altera Corporation, San
Jose, CA; Qualcomm Incorporated, San Diego, CA; Analog Devices Inc.,
Norwood, MA; LSI Corporation, Milpitas, CA; Lasertec Corporation,
Yokohama, Japan; ASE Group, Kaohsiung, Taiwan; Fujifilm Electronic
Materials, Shizuoka, Japan; Nissan Chemical Industries Ltd., Tokyo,
Japan; Sumitomo Electric Industries, Ltd., Tokyo, Japan; JSR
Corporation, Sunnyvale, CA; AZ Electronic Materials, Somerville, NJ;
Shin-Etsu Chemical Co., LTD, Niigata, Japan; Rohm and Hass Company,
Marlborough, MA; Texas Instruments, Inc., Dallas, TX; Micron
Technology, Inc., Boise, ID; National Semiconductor, Inc., Santa Clara,
CA; Renesas Technology Corporation, Tokyo, Japan; Toshiba Corporation,
Yokohama, Japan; Panasonic Semiconductor Discrete Devices Co., Ltd.,
Kyoto, Japan; Applied Materials Inc., Santa Clara, CA; Edwards Limited,
Tewksbury, MA; Texas Instruments, Dallas, TX; Matheson Tr-Gas Inc.,
Basking Ridge, NJ, have been added as parties to this venture.
Also, Texas Instruments, Inc., Dallas, TX; Freescale Semiconductor,
Inc., Austin, TX; Infineon Technologies AG, Dresden, Germany; Qimonda
AG, Dresden, Germany; and Advanced Technology Development Facility,
Inc., Austin, TX, have withdrawn as parties to this venture.
Additionally, International SEMATECH has begun to recruit and admit
program members that only join certain discrete projects and thus only
have access to information and intellectual property created under the
discrete projects that these lower-tiered members join. Hence,
International SEMATECH has four new classes of membership in addition
to its traditional core membership: (1) Program--includes integrated
circuit manufacturers, semiconductor design companies, and assembly and
packaging companies that choose to pay for and receive information and
other intellectual property developed in any of Sematech's technical
divisions; (2) Associate--includes companies that design, test, make,
market, or support materials, equipment, processes, software, systems,
or facilities for manufacturing semiconductors and that pay for and
receive access to information and other intellectual property that
arise under discrete Sematech-led projects; (3) Extreme Ultraviolet
Lithography Mask Infrastructure (``EMI'')--includes among its members
integrated circuit manufacturers and semiconductor mask makers; and (4)
3D Enablement Center--created to finance and conduct research related
to three dimensional (3D) interconnect technologies, which the chip
manufacturing and design industries perceive to be a means available to
extend Moore's law without the enormous expense associated with
development of new lithographic technologies.
International SEMATECH created a new subsidiary called
International Sematech Manufacturing Initiative, Inc. (``ISMI''), which
is also a Delaware 501(c)(6) membership corporation organized to
finance and conduct research and development related to solving
semiconductor manufacturing problems. ISMI's emphasis is on solving
today's semiconductor manufacturing challenges such as enhancing
semiconductor manufacturing equipment productivity, contributing to
increased automation in the operation of semiconductor fabrication
facilities (``fabs'') and reducing fabs' electricity and water
consumption. Sematech created the 450 LLC to finance and conduct
research and development necessary to catalyze the introduction into
the marketplace of semiconductor manufacturing equipment capable of
handling silicon wafers with a diameter of 450mm. The purpose of the
450 LLC is to aggregate funds from integrated circuit manufacturers to
finance and participate in this endeavor.
No other changes have been made in either the membership or planned
activity of the group research project. Membership in this group
research project remains open, and International SEMATECH intends to
file additional written notifications disclosing all changes in
membership.
On April 22, 1988, International SEMATECH filed its original
notification pursuant to Section 6(a) of the Act. The Department of
Justice published a notice in the Federal Register pursuant to Section
6(b) of the Act on May 19, 1988 (53 FR 17987).
The last notification was filed with the Department on June 16,
2003. A notice was published in the Federal Register pursuant to
Section 6(b) of the Act on August 4, 2003 (68 FR 45855).
Patricia A. Brink,
Director of Civil Enforcement, Antitrust Division.
[FR Doc. 2011-29079 Filed 11-14-11; 8:45 am]
BILLING CODE 4410-11-P