[Federal Register Volume 62, Number 203 (Tuesday, October 21, 1997)] [Notices] [Page 54614] From the Federal Register Online via the Government Publishing Office [www.gpo.gov] [FR Doc No: 97-27798] ----------------------------------------------------------------------- DEPARTMENT OF COMMERCE National Institute of Standards and Technology Jointly Owned Invention Available for Licensing AGENCY: National Institute of Standards and Technology Commerce; Commerce. ACTION: Notice of a jointly owned invention available for licensing. ----------------------------------------------------------------------- SUMMARY: The invention listed below is jointly owned by the U.S. Government, as represented by the Department of Commerce and Cornell University. The Department of Commerce's ownership interest in this invention is available for non-exclusive licensing in accordance with 35 U.S.C. 207 and 37 CFR part 404 to achieve expeditious commercialization of results of federally funded research and development. FOR FURTHER INFORMATION CONTACT: Technical and licensing information on this invention may be obtained by writing to: National Institute of Standards and Technology, Industrial Partnerships Program, Building 820, Room 213, Gaithersburg, MD 20899; Fax 301-869-2751. Any request for information should include the NIST Docket No. and Title for the relevant invention as indicated below. The invention available for non-exclusive licensing is: NIST Docket Number: 96-019. Title: Fabrication Of Structures By Metastable-Atom Impact Desorption Of A Passivating Layer. Description: This invention consists of a new process for fabricating microstructures on a surface. It utilizes the energy contained in neutral metastable rare gas atoms to remove passivating atoms from selected areas of a surface, allowing further chemical processing to add or remove material to the exposed areas. Some of the advantages of this process are realized by the introduction of atom optical techniques, which allow structures to be fabricated with significantly higher resolution than can be achieved with optical lithography, and with a greater amount of parallelism than can be achieved with electron or ion beam techniques. Dated: October 15, 1997. Elaine Bunten-Mines, Director, Program Office. [FR Doc. 97-27798 Filed 10-20-97; 8:45 am] BILLING CODE 3510-13-M